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儀器介紹
Instrument introduction
ICP2000是公司經多年技術積累而開發的電感耦合等離子體發射光譜儀，用于測定各種物質(可溶解于鹽酸、硝酸、氫氟酸等)中常量、微量、痕量金屬元素或非金屬元素的含量。采用先進的電子電路系統和網絡接口的通信方式，實現了儀器的尋峰、測試、譜圖描跡快速簡便化操作，自動化程度高、操作簡便、穩定可靠，使結果準確度更高，人性化設計的儀器操作界面，可針對不同元素、不同波長設置最佳的測試條件，并有儀器診斷功能，提高儀器的智能化操作。
ICP2000 is inductively coupled plasma Skyray instrument company after years of accumulation of technology and the development of emission spectrometer for the determination of various substances (soluble in hydrochloric acid, nitric acid, hydrofluoric acid, etc.) in the content of constant, trace metals or non-metallic elements. The use of advanced electronic circuit communication system and network interface, realize the instrument testing, spectrum peak search, tracing fast and simple operation, high automation, simple operation, stable and reliable, make the results more accurate, the humanized design of instrument interface, can set the optimal test conditions for different different elements, wavelength, and instrument diagnosis function, improve the intelligent operation of the apparatus.
性能特點
Performance characteristics
1.可測元素70多種
1 more than 70 elements can be measured
2.分析速度快，一分鐘可測5-8個元素
2 analysis speed, one minute can measure 5-8 elements
3.多元素同時分析，客戶可以自由選擇元素數量與安排測量順序
3 simultaneous analysis of multiple elements, customers are free to choose the number of elements and arrange the order of measurement
4.檢出限低，達到ppb量級，Ba甚至達到0.7ppb
4 detection limit is low, up to ppb order, Ba even reached 0.7ppb
5.線性動態范圍寬，高達6個數量級，高低含量可以同時測量
5 linear dynamic range of up to 6 orders of magnitude, high and low content can be measured simultaneously
6.分析成本低，一瓶氬氣可以用8個小時
6 Analysis of low cost, a bottle of argon can be used for 8 hours
7.全自動化設計，除電源開關外，儀器全部功能由軟件控制。
7 fully automatic design, in addition to the power switch, all the functions of the instrument by the software control.
8.網絡接口通訊方式，大大提升了通信速度，屏蔽了高頻的干擾。
8 network interface communication mode, greatly enhance the communication speed, shielding the high-frequency interference.
9.配備進口玻璃霧化器，霧化效率好，性能更穩定。
The 9 is equipped with imported glass atomizer, the atomizing efficiency, more stable performance.
10. 軟件通過質量流量控制器(MFC)來控制三路氣體流量。
10 software through mass flow controller (MFC) to control the flow of three gas.
11. 點火方式：軟件控制點火，有點火位置記憶功能，匹配位置記憶功能。
11 ignition mode: software control ignition, ignition position memory function, matching position memory function.
12.特有的儀器診斷功能，可實時監測儀器工作狀態。
12 special instrument diagnosis function, can monitor the working state of the instrument in real time.
13.獨立開發，具有自主知識產權的分析軟件，人性化的操作界面，中英文界面的快速切換，自動生成分析報告。
13 independent development, with independent intellectual property rights of the analysis software, user-friendly interface, the interface between English and Chinese fast switching, automatic generation of analysis reports.
技術指標
Technical index
①射頻發生器技術指標：
Technical specifications of RF generator:
1.電路類型：自激振蕩電路，同軸電纜輸出，匹配調諧，功率反饋閉環自動控制。
1 circuit type: self oscillation circuit, coaxial cable output, matching tuning, power feedback closed-loop automatic control.
2.工作頻率：40.68MHz±0.05%
2 operating frequency: 40.68MHz + 0.05%
3.頻率穩定性：<0.1%
3 frequency stability: <0.1%
4.輸出功率：800W—1200W
4 output power: 800W - 1200W
5.輸出功率穩定性：<0.2%
5 output power stability: <0.2%
6.電磁場泄漏輻射強度：距機箱30cm處電場強度E：<10V/m ;磁場：H<0.2A/m。
6 electromagnetic radiation leakage intensity: from the chassis 30cm electric field strength E:<10V/m; magnetic field: H<0.2A/m.
②進樣裝置技術指標：
Sampling equipment technical index:
1.輸出工作線圈：銅質，帶有聚四氟乙烯外套，內徑25mm，3匝。
1 output coil: copper, with Teflon coat, the inner diameter of 25mm and 3 turns.
2.矩管：三同心型，外徑20mm的石英矩管
2: three heart-shaped, rectangular tube diameter 20mm tube quartz moment
3.同軸型噴霧器：外徑6mm
3 coaxial sprayer: outer diameter 6mm
4.雙筒形霧室外徑：35mm
4 outer diameter of double cylinder fog chamber: 35mm
5.氬氣流量計規格和載氣壓力表規格：
Specification for 5 argon flow meters and gas carrying pressure gauges:
(1)等離子氣流量計 ：0.0-20.0L/min
(1) plasma gas flow meter: 0.0-20.0L/min
(2)輔助氣流量計： 0.0-1.0L/min
(2) auxiliary gas flow meter: 0.0-1.0L/min
(3)載氣流量計：0.0-1.0L/min
(3) carrier gas flowmeter: 0.0-1.0L/min
(4)載氣穩壓閥：0-0.4MPa
(4) carrier gas pressure regulator valve: 0-0.4MPa
(5)冷卻水：水溫20-25℃ 流量>7L/min 水壓>0.1MPa ，冷卻水電阻率大于1MΩ。
(5) cooling water: water temperature 20-25 >0.1MPa flow rate >7L/min water pressure, cooling water resistivity is greater than 1M.
③分光器技術指標:
The technical index of optical splitter:
1.光路：Czerny-Turner
1 light path: Czerny-Turner
2.焦距： 1000 mm
2 focal length: 1000 mm
3.光柵規格：離子刻蝕全息光柵，刻線密度3600線/mm(可選用刻線密度2400線/mm)，刻劃面積(80×110)mm
3 specifications: ion etching grating holographic grating groove density, 3600 line /mm (optional groove density 2400 line /mm), area (80 * 110). Mm
4.線色散率倒數：0.26nm/mm
4 line dispersion rate reciprocal: 0.26nm/mm
5.分辨率：≤ 0.008nm(3600刻線). ≤0.015nm(2400刻線)
Resolution: 5 = 0.008nm (3600 lines) or 0.015nm (2400 lines).
6.掃描波長范圍： 3600線/mm掃描波長范圍：190—500 nm ; 2400線/mm掃描波長范圍：190—800 nm
6 scanning wavelength range: 3600 line /mm scanning wavelength range: 190 - 500 nm; line /mm scanning wavelength range: 190 - 800 nm
7.步進電機驅動最小步距:0.001 nm
7 step motor drive minimum step: 0.001 NM
8.入射狹縫：25μm;出射狹縫：18μm
8 incident slit: 25 m; exit slit: 18 m
9.透鏡：Φ30，1：1成像
9 lens: Phi 30, 1:1 imaging
10. 反射鏡規格：(80×105)mm
10 mirror specifications: (80 x 105) mm
測光裝置:
Metering device:
1.光電倍增管規格：R212或R928
1 photomultiplier tube specification: R212 or R928
2.光電倍增管負高壓： (-50～-1000)V
2 photomultiplier tube negative pressure: (-50 ~ -1000) V
3.光電倍增管電流測量范圍： (10～12～10～4)A
3 photomultiplier tube current measurement range: (10 ~ 12 ~ ~ 10 ~ 4) A
4.信號采集方式： V/F轉換
4 signal acquisition: V/F conversion
5.采樣電路：1mv對應頻率100Hz;
5 sampling circuit: 1mV corresponding frequency 100Hz;
6.儀器數據采集： 計數方式
6 instrument data acquisition: counting method
7.測光方式：垂直觀測
7 metering method: vertical observation
標準配置
Standard configuration
1.ICP2000主機1臺
1.ICP2000 host 1
穩壓電源1臺
Regulated power supply 1
自動控溫冷卻循環水裝置1臺
Automatic temperature control cooling circulating water device 1
2.附件箱
2 accessory box
應用領域
application area
金屬材料(包括貴金屬、稀有金屬)、非金屬材料、礦石、土壤、核燃料、煤、石油及其產品、化肥、化工原料、半導體晶片、陶瓷材料、食品、藥品、血液、水(純水、廢水)、空氣等幾乎所有材料中雜質(或粒子)的測定。
The metal materials (including precious metals, rare metals), non metal materials, minerals, soil, nuclear fuel, coal, oil and oil products, chemical fertilizer, chemical raw materials, semiconductor wafer, ceramics, food, medicine, blood, water (water, water, air) are impurities in the material (or particles) the determination of.
